Electron Beam Evaporation SystemsContact TORR  for a quote for the Reactive Ion Etcher

E-Beam

The Torr International, Inc. E-beam Evaporation System is the new generation E-Beam Deposition system. Highly practical, low cost, and highly reliable systems are the future as we know it today. The EB-4P systems all have four pocket crucibles ranging from 2cc up to 60cc, and have power sources ranging from 3Kw to 10 Kw or more.

The Torr International, Inc. E-beam Evaporation System is completely customizable, and the chamber can be designed to accept additional evaporation sources later.

The unused ports are blocked off with flanges to allow future additions to your Torr system. Then later when you are ready, you can add a thermal resistance source or maybe expand your capabilities by adding DC & RF sputtering or etching. Torr International, Inc. can produce any custom system that you desire.

Call to discuss what functionality you require and your system will be designed to fit your process, your budget, and your future.

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Electron Beam Evaporation Systems

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Electron Beam Evaporation Systems - E-Beam

 

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