CRC-600

Torr International's Compact Research Coater (model number CRC- 600) Sputtering System is a manual planar magnetron sputtering system designed for the nanotechnology research environment.

This fast and affordable high-rate sputtering system provides excellent film quality in a surprisingly small footprint. The CRC-600 can be used to develop deposition processes for materials including aluminum, carbon, chromium, gold, Teflon®, silicon dioxide, tantalum, tungsten and titanium.

Since the two-inch targets can be changed quickly, the CRC-600 is easily reconfigured for applications requiring a different series of deposited materials. The 150mm substrate platform and 300mm vacuum chamber accommodates wafers up to six inches in diameter, as well as irregularly shaped substrates.

Thermal Evaporation System

Vacuum evaporation is one of the most cost-effective deposition techniques. It's also one of the oldest techniques, considering that Thomas Edison himself stated "the uses of this invention are unlimited."

Edison was not correct, however, as thermal evaporation has a number of limitations including evaporation temperature, composition of alloys and compounds and life of the source. Recently, thermal evaporation has found numerous applications for depositing organic materials such as OLED (organic light emitting diodes).

Combination Systems

• E-Beam & Thermal Evaporation System
  

  Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources. Learn More

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• E-Beam Evaporation & Ion Assisted System
  

  The E-beam Evaporation & Ion-Assisted System is completely customizable; the chamber can be designed to accept additional PVD sources. Unused ports are blocked with flanges to allow later additions. Learn More...

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• E-Beam, Thermal Evaporation & Ion Assisted System
  

  The E-Beam, Thermal Evaporation & Ion Assisted System is completely customizable; Vacuum evaporation is one of the most cost-effective deposition techniques. Learn More...

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• Customized Combination System
  

  Let Torr International build to your specifications the ultimate device, utilizing the latest in thin film nanotechnology... Learn More...

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E-Beam

Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources.

The E-Beam Evaporation System is completely customizable; the chamber can be designed to accept additional PVD sources. Unused ports are blocked with flanges to allow later additions. When you are ready, you can add a thermal resistance source or DC & RF sputtering or etching.

Reactive Ion Etcher

Torr International Inc. manufactures Reactive Ion Etchers designed for etching films of oxides, nitrides, polymers and more. Our two basic sizes accommodate a six- or twelve-inch wafer; we accept custom requests.

Reactive Ion Etchers can be manually or PC controlled, and can be table-top or stand-alone cabinet systems.

Magnetron Sputtering

The Torr MagSput™ series, the next generation Magnetron Sputtering Deposition system, is practical, inexpensive, expandable and highly reliable, ushering in the future of research.

The Magnetron Sputtering System is completely customizable. The chamber can be designed to accept additional evaporation sources, and unused ports are blocked off with flanges to allow future additions.

Additions can include Magnetron Guns, a Thermal Resistance source or Electron Beam Evaporation. Torr International can produce any custom system you desire. Call to discuss the functionality you require and a system will be designed to fit your process, your budget, and your future.