Ion Beam Depositon System
Ion beam deposition (IBD) is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Most IBD applications will use a second ion source, IBAD, to control and enhance the properties of the sputtered film.
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- Electro-Polished Stainless Steel Chamber (D-Shaped Box)
- 4” Diameter View Port on Front Door with Manual Shutter
- Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump
- Ion Beam Deposition with Convergent Beam Ion Source & Power Supply, with Easy Target Mounting Assembly
- Ion Beam Assisted Deposition with Divergent Beam Ion Source & Power Supply
- Quartz Crystal Thickness Sensor with Deposition Controller
- Mass Flow Controller with Digital Readout
- Full Range Vacuum Gauge with Digital Display & Readout
- Semi-Automatic Controlled System