Magnetron Sputtering System
The Torr International's MagSput™ series, the next generation Magnetron Sputtering Deposition system, is practical, inexpensive, expandable and highly reliable, ushering in the future of research.
Physical Vapor Deposition
Sputtering
Magnetron Sputtering System
Compact Research Coater System (CRC600 Series)
Torr International’s Compact Research Coater (model number CRC- 600) Sputtering System is a manual planar magnetron sputtering system designed for the nanotechnology research environment.
Ion Beam Sputtering System (IBD Series)
Ion Beam Depositon System
Ion beam deposition (IBD) is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Most IBD applications will use a second ion source, IBAD, to control and enhance the properties of the sputtered film.
Evaporation
Electron Beam Evaporation System
Electron Beam Evaporation System
Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources.
Resistive Thermal Evaporation System (CRTE & THE Series)
Thermal Evaporation System
Vacuum evaporation is one of the most cost-effective deposition techniques. It’s also one of the oldest techniques, considering that Thomas Edison himself stated “the uses of this invention are unlimited.”
Combination Systems
Electron Beam-Resistive Thermal Evaporation System
E-Beam & Thermal Evaporation System
Torr’s Electron Beam Deposition system is a practical and highly reliable system. The EB-4P systems have four pocket crucibles varying in volume and a variety of power sources.
Electron Beam-Resistive Thermal Evaporation-Ion Beam Assist System
E-Beam, Thermal Evaporation, and Ion Assisted System
The E-Beam, Thermal Evaporation & Ion Assisted System is completely customizable; Vacuum evaporation is one of the most cost-effective deposition techniques.
E-Beam Evaporation & Ion Assisted System
The E-beam Evaporation & Ion-Assisted System is completely customizable; the chamber can be designed to accept additional PVD sources. Unused ports are blocked with flanges to allow later additions.
Customized Systems
Customized Combination System
Let Torr International build to your specifications the ultimate device, utilizing the latest in thin film nanotechnology.
